Dynamic surface anneal: Activation without diffusion

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2004

Volumn , Issue , 2004, Pages 47-51

  Jennings, Dean ^a   Mayur, Abhilash ^a   Parihar, Vijay ^a   Liang, Haifan ^a   Mcintosh, Robert ^a   Adams, Bruce ^a   Thomas, Tim ^a   Ranish, Joe ^a   Hunter, Aaron ^a   Trowbridge, Teresa ^a   Achutharaman, Raman ^a   Thakur, Randhir ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ANALYSIS; DIFFUSION; HEAT SINKS; HEAT TRANSFER; RAPID THERMAL ANNEALING;

MOORE'S LAW; THERMAL HOMOGENIZATION; THERMAL PROCESSING;

SURFACE PROPERTIES;

EID: 28344438572     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. R.B. Fair, Concentration profiles of diffused dopants in Silicon, Impurity Doping Processes in Silicon 1981
2. Y. Kim, H.Z. Massoud, R.B. Fair, J. Electronic Materials 18, 143 1989
3. 2 laser annealing of Silicon, Solid State Communications, v36 pp.671-675 1980