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Volumn 347, Issue 3, 2005, Pages 207-216
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Development of refractory armored silicon carbide by infrared transient liquid phase processing
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
ARGON;
COATED MATERIALS;
CRACK PROPAGATION;
DEGRADATION;
EUTECTICS;
FLOW OF FLUIDS;
MOLYBDENUM;
OPTICAL MICROSCOPY;
PLASMAS;
REFRACTORY MATERIALS;
SCANNING ELECTRON MICROSCOPY;
THERMAL EXPANSION;
TUNGSTEN;
COATING LAYERS;
REFRACTORY ARMOR;
TUNGSTEN POWDER;
SILICON CARBIDE;
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EID: 28244496487
PISSN: 00223115
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnucmat.2005.08.020 Document Type: Article |
Times cited : (14)
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References (10)
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