2-dimensional distribution of dielectric constants in patterned low-k structures by a nm-probe STEM / valence EELS (V-EELS) technique

Proceedings of the IEEE 2005 International Interconnect Technology Conference, IITC

Volumn , Issue , 2005, Pages 88-90

  Shimada, Miyoko ^a,c   Otsuka, Yuji ^b   Harada, Takahiro ^b   Tsutsumida, Akihiro ^b   Inukai, Kazuaki ^a,d   Hashimoto, Hideki ^b   Ogawa, Shinichi ^a,e  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b TORAY RESEARCH CENTER INC   (Japan)

^c TOSHIBA CORPORATION   (Japan)

^d ROHM CO LTD   (Japan)

^e PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

KRAMERS-KRONIG ANALYSIS (KKA); LOCAL STRUCTURES; SCANNING TRANSMISSION ELECTRON MICROSCOPY (STEM);

OPTIMIZATION; PLASMAS; PLASTIC FILMS; RELIABILITY; TRANSMISSION ELECTRON MICROSCOPY;

PERMITTIVITY;

EID: 28244469697     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)

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