Low-temperature plasma and fullerenes

Plasma Devices and Operations

Volumn 10, Issue 2, 2002, Pages 63-98

  Dyuzhev, G A ^a,b  

^a IOFFE INSTITUTE   (Russian Federation)

^b NONE   (Russian Federation)

Author keywords

Formation process; Fullerene; Plasma, Gas discharge

Indexed keywords

FULLERENES; GAS DYNAMICS; SURFACE TREATMENT;

FORMATION PROCESS; GAS DISCHARGES; PLASMA TECHNOLOGIES;

PLASMA DEVICES;

EID: 28244458886     PISSN: 10519998     EISSN: None     Source Type: Journal    
DOI: 10.1080/10519990212829     Document Type: Review

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