Photooxidation of poly[methyl(phenyl)silylene] and effect of photostabilizers

Polymer Degradation and Stability

Volumn 91, Issue 3, 2006, Pages 573-578

  Meszaros O ^a   Schmidt, P ^a   Pospisil J ^a   Nespurek S ^a  

^a INSTITUTE OF MACROMOLECULAR CHEMISTRY   (Czech Republic)

Author keywords

Photooxidation; Photostabilization; Poly methyl(phenyl)silylene ; Polysilane degradation

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; IRRADIATION; PHOTODEGRADATION; PHOTOOXIDATION; ULTRAVIOLET SPECTROSCOPY;

PHOTOSTABILIZATION; POLY[METHYL(PHENYL)SILYLENE]; POLYSILANE DEGRADATION; SILOXANE;

OLEFINS;

EID: 28244453295     PISSN: 01413910     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymdegradstab.2005.01.059     Document Type: Conference Paper

References (5)

1. S. Hayase Polysilanes for semiconductor fabrication Prog Polym Sci 28 2003 359 381
2. S. Nešpůrek Poly(organylsilylene)s - perspective materials for optoelectronics Czech J Phys 49 1999 859 870
3. X.H. Zhang, and R. West Organosilane polymers - formable copolymers containing diphenylsilylene units J Polym Sci, Part C Polym Lett 23 1985 479 485
4. O. Meszároš, P. Schmidt, J. Pospíšil, and S. Nešpůrek Phototriggered atmospheric degradation of poly[methyl(phenyl)silanediyl] in the presence of UV absorbers J Polym Sci, Polym Chem 42 2004 714 721
5. G. Socrates Organic silicon compounds G. Socrates Infrared and Raman characteristic group frequencies 3rd ed. 2001 J. Wiley & Sons Chichester 241 246 (tables and charts)