Effect of pulsed bias on microhardness of Ti/TiN multilayer films deposited by arc ion plating

Jinshu Xuebao/Acta Metallurgica Sinica

Volumn 41, Issue 10, 2005, Pages 1106-1110

  Zhao, Yanhui ^a   Lin, Guoqiang ^a   Li, Xiaona ^a   Dong, Chuang ^a   Wen, Lishi ^a,b  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Arc ion plating; Microhardness; Pulsed bias; Ti TiN nano multilayer film

Indexed keywords

EID: 28244448209     PISSN: 04121961     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (19)