Modeling interdigital electrode structures for the dielectric characterization of electroceramic thin films

Thin Solid Films

Volumn 496, Issue 2, 2006, Pages 539-545

  Kidner, N J ^a   Homrighaus, Z J ^a   Mason, T O ^a   Garboczi, E J ^b  

^a Northwestern University   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Conformal mapping; Dielectric; Farnell; Interdigitial electrodes

Indexed keywords

CAPACITANCE; CERAMIC MATERIALS; CHARACTERIZATION; CONFORMAL MAPPING; ELECTROCHEMICAL ELECTRODES; MATHEMATICAL MODELS; PERMITTIVITY;

ELECTROCERAMIC THIN FILMS; FARNELL; FILM THICKNESS; INTERDIGITAL ELECTRODES;

THIN FILMS;

EID: 28044471823     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.350     Document Type: Article

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