Thickness measurements on transparent substrates based on reflection ellipsometry. I. Optical effects of high-refractive-index additional layers

Applied Optics

Volumn 44, Issue 28, 2005, Pages 5910-5918

  Otsuki, Soichi ^a   Ohta, Koji ^a   Tamada, Kaoru ^b   Wakida, Shin Ichi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

PERMITTIVITY; REFLECTION; REFRACTIVE INDEX; SUBSTRATES; THICKNESS MEASUREMENT;

DIELECTRIC LAYERS; THREE-PHASE SYSTEMS; TRANSPARENT SUBSTRATES;

ELLIPSOMETRY;

EID: 28044465397     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.44.005910     Document Type: Article

References (8)

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