The effect of deposition temperature and RF power on the electrical and physical properties of the MgTiO3 thin films

Journal of Crystal Growth

Volumn 285, Issue 4, 2005, Pages 586-594

  Huang, Cheng Liang ^a   Chen, Yuan Bin ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

A1. RF magnetron sputtering; A1. X ray; A3. Thin film

Indexed keywords

CAPACITANCE; ELECTRIC PROPERTIES; MAGNESIUM COMPOUNDS; MAGNETRON SPUTTERING; PERMITTIVITY; PHYSICAL PROPERTIES;

CAPACITANCE-VOLTAGE; FILM DEPOSITION; X-RAY;

THIN FILMS;

EID: 28044458302     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.09.035     Document Type: Article

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