Epitaxial growth of rhenium with sputtering

Thin Solid Films

Volumn 496, Issue 2, 2006, Pages 389-394

  Oh, Seongshik ^a,c   Hite, Dustin A ^a,d   Cicak, K ^a   Osborn, Kevin D ^a   Simmonds, Raymond W ^a   McDermott, Robert ^b   Cooper, Ken B ^b   Steffen, Matthias ^b   Martinis, John M ^b   Pappas, David P ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c University of Illinois at Urbana Champaign   (United States)

^d WESTERN STATE COLORADO UNIVERSITY   (United States)

Author keywords

Epitaxy; Rhenium; Sputtering

Indexed keywords

ANNEALING; EPITAXIAL GROWTH; SPUTTER DEPOSITION; SUBSTRATES; THERMOANALYSIS; THICK FILMS;

DC SPUTTERING; POST-DEPOSITION ANNEALING; RF SPUTTERING; TEMPERATURE DEPOSITION;

RHENIUM;

EID: 28044433003     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.091     Document Type: Article

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