On-line control of the deposition of optical coatings by magnetron sputtering

Optics InfoBase Conference Papers

Volumn , Issue , 2004, Pages

  List, Matthias ^a   Melde, Christian ^a   Köckert, Christoph ^a   Illgen, Claus ^b  

^a VON ARDENNE Anlagentechnik Gm   (Germany)

^b Berliner Glas KGaA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; NIOBIUM OXIDE; REACTIVE SPUTTERING; SILICA; TANTALUM OXIDES;

MAGNETRON-SPUTTERING; ON-LINE CONTROLS; REACTIVE SPUTTERING PROCESS; TRANSMITTANCE MEASUREMENTS;

OPTICAL COATINGS;

EID: 27944496151     PISSN: None     EISSN: 21622701     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. G. Bräuer, Large Area Deposition, Optical Interference Coatings, Springer Berlin, 2003
2. J. Szczyrbowski et al., Reactive sputtering of dielectric layer on large scale substrates using an AC twin magnetron cathode, Surface and Coating Technologies 93 (1997) 14-20
3. S. Schiller et al., The optical plasma emission - a useful tool to monitor the reactive magnetron sputtering, Paper presented on the conference in situ Monitoring and diagnostics of plasma processes
4. J. Strümpfel et al., Reactive dual magnetron sputtering for oxides for large area production of optical multilayers, Proceeding of the Technical Conference of the Society of Vacuum Coaters, New Orleans, 1997
5. K. Starke et al., Rapid prototyping of optical thin film filters, Laser Zentrum Hannover