DFM: Linking design and manufacturing

Proceedings of the IEEE International Conference on VLSI Design

Volumn , Issue , 2005, Pages 705-708

  Raghvendra, Srinivas ^a   Hurat, Philippe ^a  

^a SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL PROXIMITY CORRECTION (OPC); PHASE SHIFT MASKING (PSM); PRODUCTION LINE;

LITHOGRAPHY; PHASE SHIFT;

INTEGRATED CIRCUIT LAYOUT;

EID: 27944478180     PISSN: 10639667     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICVD.2005.80     Document Type: Conference Paper

References (11)

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3. Stefan Majoni et. al., "A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27", SPIE 2004
4. Frank Driessen et. Al, "A 65-nm node SRAM solution using alt-PSM with ArF lithography, SPIE 2004
5. Robert Lugg et. al., "An Effective Distributed Architecture for OPC & RET Applications", Bacus 2002
6. Gartner Dataquest, October 2002
7. J. Tony Pan, Ping Li, "Copper CMP and Effect of Dummy Structures," Applied Materials, Proceedings of 2000 VMIC.
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9. Michel Cote, P. Hurat, "Layout Printability Optimization using a Silicon Simulation Methodology", ISQED 2003
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11. M. Cote, et al. "How Can Design For Manufacturing Improve Mask Cost and Yield?", SemiconWest: 29th International Electronics Manufacturing Technology