SCOPUS 정보 검색 플랫폼

Volumn 44, Issue 32, 2005, Pages 6857-6860

Fabrication of alignment structures for a fiber resonator by use of deep-ultraviolet lithography

Author keywords

[No Author keywords available]

Indexed keywords

FIBER OPTICS; MICROPROCESSOR CHIPS; OPTICAL DESIGN; OPTICAL FIBERS; PHOTOLITHOGRAPHY; PHOTORESISTS;

ALIGNMENT STRUCTURES; COUPLING LOSS; DEEP-UV LITHOGRAPHY; FIBER RESONATORS;

OPTICAL RESONATORS;

EID: 27944462273 PISSN: 1559128X EISSN: 15394522 Source Type: Journal
DOI: 10.1364/AO.44.006857 Document Type: Article

Times cited : (17)

References (10)

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2
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- Controlling cold atoms using nanofabricated surfaces: Atom chips
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- Folman, R.¹ Krüger, P.² Cassettari, D.³ Hessmo, B.⁴ Maier, T.⁵ Schmiedmayer, J.⁶

3
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- Possibility of single-atom detection on a chip
- P. Horak, B. G. Klappauf, A. Haase, R. Folman, J. Schmiedmayer, P. Domokos, and E. A. Hinds, "Possibility of single-atom detection on a chip," Phys. Rev. A 67, 043806 (2003).
- (2003) Phys. Rev. A , vol.67 , pp. 043806
- Horak, P.¹ Klappauf, B.G.² Haase, A.³ Folman, R.⁴ Schmiedmayer, J.⁵ Domokos, P.⁶ Hinds, E.A.⁷

4
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- NANO SU-8 50; the SU-8 photoresist for MEMS, http://aveclafaux. freeservers.com/SU-8.html
- Microchem, http://www.microchem.com, NANO SU-8 50; the SU-8 photoresist for MEMS, http://aveclafaux.freeservers.com/SU-8.html.

5
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- SU-8: A high performance material for MEMS applications
- R. Ruhmann, K. Pfeiffer, M. Falenski, F. Reuther, R. Engelke, and G. Grützner, "SU-8: a high performance material for MEMS applications," Polymers in MEMS, http://www.microchem.com/resources/ tok_ebeam_resist.pdf.
- Polymers in MEMS
- Ruhmann, R.¹ Pfeiffer, K.² Falenski, M.³ Reuther, F.⁴ Engelke, R.⁵ Grützner, G.⁶

6
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- M. Wilzbach, Physikalisches Institut der Universität Heidelberg, Philosophenweg 12, D-69120 Heidelberg, Germany, is preparing a manuscript to be called "Building microcavities with optical fibers for single atom detection."
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- Wilzbach, M.¹

7
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- Springer-Verlag
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10
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.