Continuous monitoring of metal volatilisation in a plasma furnace by inductively coupled plasma emission spectrometry

High Temperature Material Processes

Volumn 1, Issue 4, 1997, Pages 449-460

  Trassy, C ^a   Petit, F ^b   Diemiaszonek, R ^c   Fauchais, P ^b  

^a UNIV GRENOBLE ALPES   (France)

^b PLM   (France)

^c UNIVERSITÉ DE LYON   (France)

Author keywords

Continuous emission monitoring; Gas control; Inductively coupled plasma emission spectroscopy; Process control

Indexed keywords

EID: 27844598269     PISSN: 10933611     EISSN: None     Source Type: Journal    
DOI: 10.1615/HighTempMatProc.v1.i4.40     Document Type: Article

References (19)

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