Influence of Re on the thermo-electron emission from thoriated W cathode during Re deposition by thermionic vacuum ARC (TVA) method

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 5, 2005, Pages 2513-2519

  Lungu, C P ^a   Mustata, I ^a   Lungu, A M ^a   Zaroschi, V ^a   Musa, G ^a   Iwanaga, I ^b   Tanaka, R ^b   Matsumura, Y ^b   Tanaka, H ^b   Oi, T ^b   Fujita, K ^b   Iwasaki, K ^b  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b Japan Ultra high Temperature Materials Research Institute   (Japan)

Author keywords

Corona plasmas; Gases pollution control; Plasma; Re; Repetitive high voltage pulses; Thermionic vacuum arc; Thermo electron emission

Indexed keywords

DEPOSITION RATES; PLASMAS; POLLUTION CONTROL; RHENIUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY;

CORONA PLASMAS; HIGH MELTING; HIGH VOLTAGE PULSE; HIGH WORK FUNCTION; LOW VAPOR PRESSURES; THERMIONIC VACUUM ARC; THERMIONIC VACUUM ARC METHODS; THERMO-ELECTRON EMISSION;

ELECTRON EMISSION;

EID: 27844555509     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (6)

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2. M. Fukumoto, Y. Matsumura, S. Hayashi, T. Narita, K. Sakamoto, R. Tanaka, Report of the 123rd Committee on Heat Resisting Metals and Alloys, JSPS 143, 383 (2002).
3. G. Musa, H. Ehrich, J. Schuhmann, IEEE Transactions of Plasma Science 25, (1997) 386-391.
4. K. Iwasaki, I. Mustata, G. Musa, C. P. Lungu, A. M. Lungu, V. Zaroschi, Analele Stiintifice ale Universitatii "Alexandru Ioan Cuza'Iasi, Tomul L, s. Fizica, (2004), 171-179.
5. A. Roth, Vacuum Technology, North Holland Publ. Company, 1976.
6. K. Christmann, Introduction to Surface Physical Chemistry Springer, NY, 1991.