Comparison of air and argon plasmas in gaseous elemental pollutant analysis for process control and environment

High Temperature Material Processes

Volumn 1, Issue 4, 1997, Pages 461-472

  Gomes A M ^a   Trassy, C ^b   Almi, A ^a   Seddiki, F ^c   Hassaine, S ^c  

^a UNIVERSITÉ PAUL SABATIER   (France)

^b UNIV GRENOBLE ALPES   (France)

^c UNIVERSITÉ DE LYON   (France)

Author keywords

Air plasma; Continuous emission monitoring; Elemental pollutants; Inductively coupled plasma optical emission spectroscopy

Indexed keywords

EID: 27844538732     PISSN: 10933611     EISSN: None     Source Type: Journal    
DOI: 10.1615/HighTempMatProc.v1.i4.50     Document Type: Review

References (30)

1. "Determination of Metals Emissions from Stationary Sources.", U.S. Environmental Protection Agency Draft Method 29, Certified Federal Register Part 60, Appendix A, Promulgated December 1992.
2. "Council Directive 94/67/CE on the Incineration of Hazardous Wastes.", J. Europ. Comm., 31 December 1994, L 365, (1994) 34.
3. Technische Anleitung Luft 1986 : Erste allgemeine Verwaltungsvorschrift zum Bundesimmissionsschutzgesetz. 17 Verordnung zur Durchführung des Bundesimmissionsschutzgesetz.
4. er mars 1993 relatif aux prélèvements et à la consommation d'eau ainsi qu'aux rejets de toute nature des installations classées pour la protection de l'environnement soumises à autorisation." J. O. Rep. Fr. 28 March 1993, (1993) 5283.
5. M. Demange, B. Hervé-Bazin and B. Carton. Problèmes liés au prélèvement de métaux et de composés métalliques à l'état de vapeurs. Analusis, 19 (1991) 73-78.
6. M.D. Seltzer. Instrumental considerations for high-sensitivity continuous emissions monitoring of hazardous air pollution metals. Process Cont. Quality, 7 (1995) 71-77.
7. C. Trassy. Gas control : A new application field for ICP. European Spectroscopy, 7, Jan/Feb (1996) 20-26.
8. L.W. Peng, W.L. Flower, K.R. Hencken, H.A. Johnsen, R.F. Renzi and N.B. French. A laser based technique for continuously monitoring metal emissions from thermal waste treatment units. Process Cont. Quality. 7 (1995) 39-49.
9. S. Yalcin, D.R. Crosley, G.P. Smith and G.W. Faris. Spectroscopic characterization of laser-produced plasmas for in situ toxic metal monitoring. Hazard. Waste Hazard. Mater., 13 (1996) 51-61.
10. K.P. Carney. Development of a real-time monitor for metallic off-gases emitted from hazardous mixed waste processing systems. Process Cont. Quality, 7 (1995) 91-96.
11. S. Kirschner, A. Golloch and U. Telgheder. First investigations for the development of a microwave-induced plasma atomic emission spectrometry system to determine trace metals in gases. J. Anal. At. Spectrom., 9 (1994) 971-974.
12. V. Siemens, T. Harju, T. Laitinen and K. Larjava, J.A.C. Broekaert. Applicability of microwave induced plasma optical emission spectrometry (MIP-OES) for continuous monitoring of mercury in flue gases. Fres. J. Anal. Chem., 351 (1995) 11-18.
13. P.P. Woskov, D.Y. Rhee, P. Thomas, D.R. Cohn, I.E. Surma and C.H. Titus. Microwave plasma continuous emissions monitor for trace-metals in furnace exhaust. Rev. Scientific Inst., 67 (1996) 3700-3707.
14. D. Nore, A.M. Gomes, J. Bacri and J. Cabe. Development of an apparatus for the detection and measurement of the metallic aerosol concentration in atmospheric air in situ and in real time : preliminary results. Spectrochim. Acta, Part B, 48 (1993) 1411-1419.
15. A.M. Gomes, J.P. Sarrette, L. Madon and A. Almi. Continuous emission monitoring of metal aerosol concentrations in atmospheric air. Spectrochim. Acta, Part B, 51 (1996) 1695-1705
16. G.I. Babat. Electrodeless discharges and some allied problems. J. Inst. Electr. Eng. ; 94 (1947) 27-37.
17. M.D. Seltzer and R.B. Green. Instrumentation for continuous emissions monitoring of airborne metals. Process Cont. Quality, 6 (1994) 37-46.
18. D.P. Baldwin, D.S. Zamzow and A.P. D'silva. Detection limits for hazardous and radioactive elements in airborne aerosols using inductively coupled air plasma-atomic emission spectrometry. J. Air Waste Manage. Assoc. 45 (1995) 789-791.
19. Z. Zhu, R.A. Green, M.J. McCarthy and G.P. Miller. A fieldable air ICP for on-line toxic metal monitoring. 1997 Winter Conference on Plasma Spectrochemistry, Gent, Belgium, 12-16 January 1997.
20. G.A. Meyer and K.W. Lee. Real-time determination of metal hazardous air pollutants in flue gas emissions : Laboratory study. Process Cont. Quality, 6 (1994) 187.
21. C. Trassy and R. Diemiaszonek. Heavy elements in gaseous effluents : study of a direct analytical method. High Temp. Chem. Proc., 3 (1994) 439-447.
22. T. Jacksier and R.M. Barnes. Quantitative analysis of electronic-grade anhydrous hydrogen chloride by sealed inductively coupled plasma atomic emission spectroscopy. J. Anal. At. Spectrom., 9 (1994) 1299-1303.
23. A.D. Sappey, D. Hyatt and F. Sagan. Sensitive detection of trace metals on fly ash by ICP-AES. paper 253, 21st An. Conf. of the FACSS., St Louis, 2-7 Oct. (1994).
24. C. Trassy and R. Diemiaszonek. On-line analysis of elemental pollutants in gaseous effluents by inductively coupled plasma optical emission spectrometry: Thermodynamic aspects. J. Anal. At. Spectrom., 10 (1995) 661-669.
25. C. Trassy, R. Diemiazsonek, P. Pasquini and R. Meunier. On-line analysis of elemental pollutants in gaseous effluents by ICP-OES. 2nd Int. Symp. on Environmental Technologies. Atlanta, USA, 8-11 Oct (1995).
26. G.A. Meyer and M. Seltzer. Continuous ICP measurement of hazardous metals in stack gas emissions. American Laboratory, 29, 4 (1997), L34-L36.
27. R.C. Hutton, M. Bridenne, E. Coffre, Y. Marot and F. Simondet. Investigation into the direct analysis of semiconductor grade gases by ICP-MS. J. Anal. At. Spectrom., 5, (1990) 463-466.
28. H. Klinkenberg, B.J. Kip and W. Van Borm. The continuous on-line monitoring of the trace elemental composition of industrial ethylene gas by means of ICP-MS. 1996 Winter Conf. on Plasma Spectrochem. ; Lauderdale, Florida, Jan 8-13 (1996), WP40.
29. I. Novotny, J.C. Farinas, J.L. Wan, E. Poussel and J.M. Mermet. Effect of power and carrier gas flow rate on the tolerance to water loading in inductively coupled plasma atomic emission spectrometry. Spectrochim. Acta, Part B, 51 (1996) 1517-1526.
30. M. Carré, E. Coffre, A. Morin-Adam and J. Desbonnet. Calibrationof high resolution ICP-MS for direct analysis of specialty gases. 1995 Winter Conf. on Plasma Spectrochem. ; Cambridge, UK, Jan 7-12 (1995).