H-sensitive radiative recombination path in Si nanoclusters embedded in SiO2

Applied Physics Letters

Volumn 87, Issue 21, 2005, Pages 1-3

  Comedi, D ^a   Zalloum, O H Y ^a   Mascher, P ^a  

^a MCMASTER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRON CYCLOTRON RESONANCE; NANOSTRUCTURED MATERIALS; PASSIVATION; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON;

DANGLING BONDS; NANOCLUSTERS; PL INTENSITY; SHALLOW STATES;

SILICA;

EID: 27844507132     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2135382     Document Type: Article

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