Stacking faults in the structure of nickel hydroxide: A rationale of its high electrochemical activity

Journal of Materials Chemistry

Volumn 7, Issue 8, 1997, Pages 1439-1443

  Delmas, Claude ^a   Tessier, Cecile ^a  

^a Ecole Nationale Superieure de Chimie et de Physique de Bordeaux   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 27844468851     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/a701037k     Document Type: Article

References (11)

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