Threshold energy of formation of an oxygen vacancy defect in SiO 2 by atomic displacements using molecular dynamics

Fusion Engineering and Design

Volumn 75-79, Issue SUPPL., 2005, Pages 1027-1030

  Mota, F ^a   Caturla, M J ^b,c   Perlado, J M ^a   Dominguez, E ^a   Kubota, A ^c  

^a INSTITUTO DE FUSIÓN NUCLEAR   (Spain)

^b UNIVERSITY OF ALICANTE   (Spain)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FUSION REACTORS; IRRADIATION; LIGHT TRANSMISSION; MOLECULAR DYNAMICS; SILICA;

ATOMIC DISPLACEMENTS; OXYGEN RECOIL; OXYGEN VACANCY;

OXYGEN;

EID: 27844458499     PISSN: 09203796     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.fusengdes.2005.06.215     Document Type: Article

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