Microwave-assisted vapor phase dissolution of photoresist and silicon oxide based slurry samples for the determination of trace impurities by high resolution ICP-MS

Journal of Analytical Atomic Spectrometry

Volumn 20, Issue 11, 2005, Pages 1290-1292

  Wan, Chia Ching ^a,b   Jiang, Shiuh Jen ^a   You, Min Ta ^b   Sahayam, A C ^c  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^c National Centre for Compositional Characterisation of Materials (CCCM)   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CONTAMINATION; ELECTRONICS INDUSTRY; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETERS; MICROWAVES; SLURRIES; VAPORIZATION; VAPORS;

DETECTION LIMITS; ICP-SFMS; MATRIX REMOVAL METHOD; PHOTORESIST;

DISSOLUTION;

EID: 27744609174     PISSN: 02679477     EISSN: 13645544     Source Type: Journal    
DOI: 10.1039/b507640d     Document Type: Article

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