Optical coupling analysis of dual-waveguide structure for monolithic integration of photonic devices

IEEE Photonics Technology Letters

Volumn 17, Issue 11, 2005, Pages 2304-2306

  Kang, Young Shik ^a   Kim, Sung Bock ^a   Chung, Yong Duck ^a   Kim, Jeha ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Dual waveguide structure (DWS); Electroabsorption modulator (EAM); Monolithic integration; Spot size converter (SSC); Waveguide photodiode

Indexed keywords

INSERTION LOSSES; LIGHT MODULATORS; LIGHT TRANSMISSION; OPTICAL FIBER COUPLING; OPTICAL FIBERS; OPTICAL WAVEGUIDES; PHOTODETECTORS; PHOTODIODES; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE STRUCTURES;

BEAM PROPAGATION METHOD (BPM); COUPLING LOSS; DUAL-WAVEGUIDE STRUCTURE (DWS); ELECTROABSORPTION MODULATOR (EAM); MONOLITHIC INTEGRATION; SPOT SIZE CONVERTER (SSC); WAVEGUIDE PHOTODIODE;

INTEGRATED OPTOELECTRONICS;

EID: 27744594136     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2005.858053     Document Type: Article

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