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Volumn , Issue , 2005, Pages 518-523

A study of electromigration failure in PB-free solder joints

Author keywords

Electromigration; Pb free; Under bump metallization

Indexed keywords

PB-FREE; SOLDER BUMPS; TEMPERATURE DEPENDENCE; UNDER BUMP METALLIZATION;

EID: 27744574109     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (25)

References (17)
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  • 6
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  • 8
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    • Dallas, TX, Mar.
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    • Ding, M.1    Matsuhashi, H.2
  • 9
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  • 13
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    • Clement, J. J., et al, "Reliability analysis for encapsulated interconnect lines under dc and pulsed dc current using a continuum electromigration transport model," Journal of Applied Physics, v 82, n 12, 1997, pp. 5991-6000.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.