Growth and characterization of InGaN blue LED structure on Si(1 1 1) by MOCVD

Journal of Crystal Growth

Volumn 285, Issue 3, 2005, Pages 312-317

  Mo, Chunlan ^a   Fang, Wenqing ^a   Pu, Yong ^a   Liu, Hechu ^a   Jiang, Fengyi ^a  

^a NANCHANG UNIVERSITY   (China)

Author keywords

A1. X ray diffraction; A3. Metalorganic chemical vapor deposition; B1. Nitrides; B1. Si substrate; B3. Light emitting diodes

Indexed keywords

CRYSTAL GROWTH; ELECTRIC POTENTIAL; ELECTROLUMINESCENCE; HIGH TEMPERATURE EFFECTS; INDIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; SILICON WAFERS; X RAY DIFFRACTION;

CRACK-FREE FILMS; INJECTION CURRENT; OPERATING VOLTAGE; SI-SUBSTRATE;

LIGHT EMITTING DIODES;

EID: 27644592789     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.08.046     Document Type: Article

References (19)

1. S.A. Nikishin, N.N. Faleev, V.G. Antipov, S. Francoeur, L. Grave de Peralta, G.A. Seryogin, H. Temkin, T.I. Prokofyeva, M. Holtz, and S.N.G. Chu Appl. Phys. Lett. 75 1999 2073
2. A. Dadgar, J. Bläsing, A. Diez, A. Alam, M. Heuken, and A. Krost Jpn. J. Appl. Phys. 39 2000 L1183
3. E. Feltin, B. Beaumont, M. Laügt, P. de Mierry, P. Vennéguès, H. Lahrèche, M. Leroux, and P. Gibart Appl. Phys. Lett. 79 2001 3230
4. Y. Honda, Y. Kuroiwa, M. Yamaguchi, and N. Sawaki Appl. Phys. Lett. 80 2002 222
5. A. Reiher, J. Bläsing, A. Dadgar, A. Diez, and A. Krost J. Crystal Growth 248 2003 563
6. S. Guha, and N.A. Bojarczuk Appl. Phys. Lett. 72 1998 415
7. C.A. Tran, A. Osinski, R.F. Karlicek Jr., and I. Berishev Appl. Phys. Lett. 75 1999 1494
8. J.W. Yang, A. Lunev, G. Simin, A. Chitnis, M. Shatalov, M.A. Khan, J.E. Van Nostrand, and R. Gaska Appl. Phys. Lett. 76 2000 273
9. E. Feltiné, S. dalmasso, P. de Mierry, B. Beaumont, H. Lahrèche, A. Bouillé, H. Haas, M. Leroux, and P. Gibart Jpn. J. Appl. Phys. 40 2001 L738
10. A. Dadgar, M. Poschenrieder, J. Bläsing, K. Fehse, A. Diez, and A. Krost Appl. Phys. Lett. 80 2002 3670
11. B. Zhang, T. Egawa, H. Ishikawa, Y. Liu, and T. Jimbo Jpn. J. Appl. Phys. 42 2003 L226
12. A. Dadgar J. Crystal Growth 248 2003 556
13. B. Heying, X.H. Wu, S. Keller, Y. Li, D. Kapolnek, B.P. Keller, S.P. DenBaars, and J.S. Speck Appl. Phys. Lett. 68 1996 643
14. L. Liu, and J.H. Edgar Mater. Sci. Eng. R 37 2002 61
15. H. Amano, N. Sawaki, I. Akasaki, and Y. Toyoda Appl. Phys. Lett. 48 1986 353
16. F. Semond, B. Damilano, S. Vezian, N. Grandjean, M. Leroux, and J. Massies Appl. Phys. Lett. 75 1 1999 82
17. H. Ishikawa, G.Y. Zhao, N. Nakada, T. Egawa, T. Soga, T. Jimbo, and M. Umeno Phys. Stat. Sol. (a) 176 1999 599
18. A. Dadgar, M. Poschenrieder, A. Reiher, J. Bläsing, J. Christen, A. Krtschil, T. Finger, T. Hempel, A. Diez, and A. Krost Appl. Phys. Lett. 82 2003 28
19. T. Yang, K. Uchida, T. Mishimo, and J. Kasai J. Gotoh, Phys. Stat. Sol. (a) 180 2000 45