메뉴 건너뛰기




Volumn , Issue , 2005, Pages 33-38

High speed test structures for in-line process monitoring and model calibration

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; CMOS INTEGRATED CIRCUITS; SWITCHING;

EID: 27644574245     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (38)

References (6)
  • 2
    • 27644485233 scopus 로고
    • Weste and kamran eshraghian
    • Addison-Wesley Pub. Company, New York
    • Neil H. E. Weste and Kamran Eshraghian, Principles of CMOS VLSI Design, Addison-Wesley Pub. Company, New York, 1992.
    • (1992) Principles of CMOS VLSI Design
    • Neil, H.E.1
  • 3
    • 1842427538 scopus 로고    scopus 로고
    • Circuit and technique for characterizing switching delay history effects in silicon-on-insulator logic gates
    • M. B. Ketchen, M. Bhushan, and C. J. Anderson, "Circuit and Technique for Characterizing Switching Delay History Effects in Silicon-On-Insulator Logic Gates", RSI, 75, pp. 768-771 2004.
    • (2004) RSI , vol.75 , pp. 768-771
    • Ketchen, M.B.1    Bhushan, M.2    Anderson, C.J.3
  • 4
    • 0034454057 scopus 로고    scopus 로고
    • Controlling floating-body effects for 0.13 μm and 0.10 μm SOI CMOS
    • S. Fung, et. al. "Controlling Floating-Body Effects for 0.13 μm and 0.10 μm SOI CMOS," IEDM 2000 Technical Digest, p. 231.
    • IEDM 2000 Technical Digest , pp. 231
    • Fung, S.1
  • 5
    • 16244421355 scopus 로고    scopus 로고
    • Technique for rapid
    • In-Line Characterization of Switching History in Partially Depleted SOI Technologies
    • D. J. Pearson, M. B. Ketchen and M. Bhushan, 'Technique for Rapid, In-Line Characterization of Switching History in Partially Depleted SOI Technologies", Proc. of 2004 SOI Conference, pp. 148-150, 2004.
    • (2004) Proc. of 2004 SOI Conference , pp. 148-150
    • Pearson, D.J.1    Ketchen, M.B.2    Bhushan, M.3
  • 6
    • 20144388033 scopus 로고    scopus 로고
    • Body voltage and history effect sensitivity to key device parameters in 90nm PD SOI
    • S. Kawanaka et al. "Body Voltage and History Effect Sensitivity to Key Device Parameters in 90nm PD SOI", Proc. of 2004 SOI Conference, pp. 19-20, 2004.
    • (2004) Proc. of 2004 SOI Conference , pp. 19-20
    • Kawanaka, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.