Residual stress and microstructural evolution in tantalum oxide coatings on silicon nitride

Journal of the American Ceramic Society

Volumn 88, Issue 8, 2005, Pages 2169-2176

  Weyant, C M ^a,d   Faber, K T ^a,d   Almer, J D ^b   Guiheen, J V ^c  

^a Northwestern University   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c HONEYWELL   (United States)

^d AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSTRUCTURAL EVOLUTION; PHASE STABILITY; SILICON NITRIDE-BASED CERAMICS; TANDALUM OXIDE;

GRAIN SIZE AND SHAPE; MICROSTRUCTURE; PROTECTIVE COATINGS; SILICON NITRIDE; TANTALUM COMPOUNDS; THERMAL EXPANSION; X RAY DIFFRACTION ANALYSIS;

CERAMIC COATINGS;

EID: 27644563450     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2005.00396.x     Document Type: Article

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