Study of optimized complexing agent for low-phosphorus electroless nickel plating bath

Journal of the Electrochemical Society

Volumn 152, Issue 10, 2005, Pages

  Cui, Guofeng ^a,b   Li, Ning ^a   Li, Deyu ^a   Chi, Minglei ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b ELECTROCHEMICAL SOCIETY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION RATE; ELECTROLESS NICKEL PLATING BATH; HETEROCATALYSIS; X-RAY FLUORESCENCE SPECTROMETER (XRF);

CATALYSIS; COMPLEXATION; CYCLIC VOLTAMMETRY; NICKEL; PHOSPHORUS; X RAY SPECTROMETERS;

ELECTROLESS PLATING;

EID: 27644525635     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2001487     Document Type: Article

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