Determining the electron temperature in inductively coupled nitrogen plasmas by optical emission spectroscopy with molecular kinetic effects

Physics of Plasmas

Volumn 12, Issue 10, 2005, Pages 1-4

  Zhu, Xi Ming ^a   Pu, Yi Kang ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; KINETIC THEORY; NITROGEN;

ELECTRON TEMPERATURE; LANGMUIR PROBES; MOLECULAR KINETIC EFFECTS; OPTICAL EMISSION SPECTROSCOPY;

INDUCTIVELY COUPLED PLASMA;

EID: 27644477375     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2061587     Document Type: Article

References (27)

1. J. Hopwood, Plasma Sources Sci. Technol. 1, 109 (1992).
2. N. K. Bibinov, D. B. Kokh, N. B. Kolokolov, V. A. Kostenko, D. Meyer, I. P. Vinogradov, and K. Wiesemann, Plasma Sources Sci. Technol. 7, 298 (1998).
3. I. P. Vinogradov, Plasma Sources Sci. Technol. 8, 299 (1999).
4. K. Behringer and U. Fantz, J. Phys. D 27, 2128 (1994).
5. G. Crolly and H. Oechsner, Eur. Phys. J. A 15, 49 (2001).
6. J. Ma and Y. K. Pu, Chin. Phys. Lett. 20, 1527 (2003).
7. J. Ma and Y. K. Pu, Phys. Plasmas 10, 4118 (2003).
8. J. Loureiro, P. A. Sa, and V. Guerra, J. Phys. D 34, 1769 (2001).
9. E. Augustyniak and J. Borysow, J. Phys. D 27, 652 (1994).
10. V. Guerra, P. A. Sa, and J. Loureiro, Eur. Phys. J.: Appl. Phys. 28, 125 (2004).
11. P. Supiot, D. Blois, S. De Benedictis, G. Dilecce, M. Barj, A. Chapput, O. Dessaux, and P. Goudmand, J. Phys. D 32, 1887 (1999).
12. S. De Benedictis, G. Dilecce, and M. Simek, J. Chem. Phys. 110, 2947 (1999).
13. V. Guerra and J. Loureiro, Plasma Sources Sci. Technol. 6, 361 (1997).
14. V. Guerra and J. Loureiro, J. Phys. D 28, 1903 (1995).
15. L. G. Piper, J. Chem. Phys. 91, 864 (1989).
16. L. G. Piper, J. Chem. Phys. 97, 270 (1992).
17. A. Lofthus and P. H. Krupenie, J. Phys. Chem. Ref. Data 6, 113 (1977).
18. P. J. Chantry, J. Appl. Phys. 62, 1141 (1987).
19. D. C. Cartwright, S. Trajmar, A. Chutjian, and W. Williams, Phys. Rev. A 16, 1041 (1977).
20. T. Majeed and D. J. Strickland, J. Phys. Chem. Ref. Data 26, 335 (1997).
21. F. R. Gilmore, R. R. Laher, and P. J. Espy, J. Phys. Chem. Ref. Data 21, 1005 (1992).
22. Z. D. Kang and Y. K. Pu, Chin. Phys. Lett. 19, 211 (2002).
23. J. Levaton, J. Amorim, V. Monna, J. Nagai, and A. Ricard, Eur. Phys. J.: Appl. Phys. 26, 59 (2004).
24. B. Bakowski, G. Hancock, R. Peverall, G. A. D. Ritchie, and L. J. Thornton, J. Phys. D 37, 2064 (2004).
25. M. Simek and S. De Benedictis, Plasma Chem. Plasma Process. 15, 451 (1995).
26. L. G. Piper, J. Chem. Phys. 88, 231 (1988).
27. L. G. Piper, J. Chem. Phys. 90, 7087 (1989).