-
1
-
-
27544500495
-
-
Patents DE4241045, US 5501893 and EP 625285
-
Patents DE4241045, US 5501893 and EP 625285, authors: Franz Lärmer, Andrea Schilp.
-
-
-
Lärmer, F.1
Schilp, A.2
-
2
-
-
0027202854
-
Cryogenic dry etching for high aspect ratio microstructures
-
Fort Lauderdale, FL, Feb.
-
K. Murakami, Y. Wakabayashi, K. Minami, and M. Esashi, 'Cryogenic dry etching for high aspect ratio microstructures' in Proc. IEEE MEMS. Conf., Fort Lauderdale, FL, Feb. 1993, pp. 65-70.
-
(1993)
Proc. IEEE MEMS. Conf.
, pp. 65-70
-
-
Murakami, K.1
Wakabayashi, Y.2
Minami, K.3
Esashi, M.4
-
3
-
-
0036684902
-
Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures
-
M.J. de Boer, J.G.E. Gardeniers, H.V.Jansen, E. Smulders, M.J. Gilde, G. Roelofs, J.N. Sasserath, M. Elwenspoek, 'Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures'. IEEE/ASME J. Microelectromech. Syst., Vol.11 No 4 (2002) 385-401
-
(2002)
IEEE/ASME J. Microelectromech. Syst.
, vol.11
, Issue.4
, pp. 385-401
-
-
De Boer, M.J.1
Gardeniers, J.G.E.2
Jansen, H.V.3
Smulders, E.4
Gilde, M.J.5
Roelofs, G.6
Sasserath, J.N.7
Elwenspoek, M.8
-
4
-
-
27544499336
-
A contour-lithography technology for rapid and precise deep-etched nano-MEMS structure fabrication
-
Seoul, June
-
M. Kubota, Y. Mita, K. Ito, F. Marty, T. Bourouina and T. Shibata, «A Contour-Lithography Technology for Rapid and Precise Deep-Etched Nano-MEMS Structure Fabrication » TRANSDUCERS'05 conference, Seoul, June (2005)
-
(2005)
Transducers'05 Conference
-
-
Kubota, M.1
Mita, Y.2
Ito, K.3
Marty, F.4
Bourouina, T.5
Shibata, T.6
-
5
-
-
27544434871
-
Electrical critical dimension measurement method by integration of test structure into MEMS devices
-
Seoul, June
-
K. Ito, Y. Mita, M. Kubota, F. Marty, T. Bourouina « Electrical Critical Dimension Measurement Method by Integration of Test Structure into MEMS Devices » TRANSDUCERS'05 conference, Seoul, June (2005)
-
(2005)
Transducers'05 Conference
-
-
Ito, K.1
Mita, Y.2
Kubota, M.3
Marty, F.4
Bourouina, T.5
-
6
-
-
0038058747
-
Micromachined in-plane tunable optical filter using thermo-optic effect
-
January
-
J.H. Lee, S. Yun « Micromachined in-plane tunable optical filter using thermo-optic effect ». Proceedings of SPIE Vol. #4983, January (2003)
-
(2003)
Proceedings of SPIE
, vol.4983
-
-
Lee, J.H.1
Yun, S.2
-
7
-
-
27544481181
-
Design of a MEMS tunable optical filter based on a novel vertical DBR architecture
-
Toulouse, France, July
-
B. Saadany, T. Bourouina, D. Khalil, "Design of a MEMS Tunable Optical Filter Based on a Novel Vertical DBR Architecture", MEMSWAVE Conference, Toulouse, France, July (2003).
-
(2003)
MEMSWAVE Conference
-
-
Saadany, B.1
Bourouina, T.2
Khalil, D.3
-
8
-
-
48049085939
-
Crystalline Si-based In-plane tunable fabry-perot filter with wide tunable range
-
Hawaii, August 19
-
S.S. Yun, K.W. Jo and J.H. Lee « Crystalline Si-based In-plane Tunable Fabry-Perot Filter with Wide Tunable Range » IEEE/LEOS Optical MEMS and their applications, Hawaii, August 19 (2003)
-
(2003)
IEEE/LEOS Optical MEMS and Their Applications
-
-
Yun, S.S.1
Jo, K.W.2
Lee, J.H.3
-
9
-
-
0141607071
-
A micromachined in-plane tunable optical filter using the thermo-optic effect of crystalline silicon
-
S.S. Yun and J.H. Lee "A micromachined in-plane tunable optical filter using the thermo-optic effect of crystalline silicon". J. Micromech. Microeng. 13 (2003) 721-725
-
(2003)
J. Micromech. Microeng.
, vol.13
, pp. 721-725
-
-
Yun, S.S.1
Lee, J.H.2
-
10
-
-
22144491766
-
A MEMS tunable optical filter based on vertical DBR architecture
-
Montreux, Switzerland, May 12-14
-
B. Saadany, F. Marty, Y. Mita, D. Khalil and T. Bourouina, 'A MEMS Tunable Optical Filter Based on Vertical DBR Architecture'. DTIP'04; Design, Test, Integration and Packaging of MEMS and MOEMS, Montreux, Switzerland, May 12-14 (2004).
-
(2004)
DTIP'04; Design, Test, Integration and Packaging of MEMS and MOEMS
-
-
Saadany, B.1
Marty, F.2
Mita, Y.3
Khalil, D.4
Bourouina, T.5
-
11
-
-
27544448352
-
Advanced silicon etching techniques based on Deep Reactive Ion Etching (DRIE) for silicon HARMS and 3D micro-and nano-structures
-
Paris, October 20-21
-
F. Marty, L. Rousseau, B. Saadany, B. Mercier, O. Français, Y. Mita, T. Bourouina "Advanced Silicon Etching Techniques Based on Deep Reactive Ion Etching (DRIE) for Silicon HARMS and 3D Micro-and Nano-Structures", ASME/European Micro and Nanosystem Conference EMN'04, Paris, October 20-21 (2004) 25-28
-
(2004)
ASME/European Micro and Nanosystem Conference EMN'04
, pp. 25-28
-
-
Marty, F.1
Rousseau, L.2
Saadany, B.3
Mercier, B.4
Français, O.5
Mita, Y.6
Bourouina, T.7
|