Manipulation of micro-disperse particles in a process plasma;Gezielte manipulation von mikropartikeln in einem plasma

Vakuum in Forschung und Praxis

Volumn 17, Issue 5, 2005, Pages 259-261

  Basner, Ralf ^a   Fehske, Holger ^b   Kersten, Holger ^a   Kosse, Sylvio ^a   Schubert, Gerald ^b  

^a Institut für Niedertemperatur Plasmaphysik Greifswald   (Germany)

^b UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MICRO-DISPERSE MATERIALS; OPTIMAL TREATMENT; PROCESS PLASMA;

COATINGS; POWDERS; SURFACE TREATMENT;

PLASMA FLOW;

EID: 27544437362     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/vipr.200500267     Document Type: Article

References (4)

1. New J. Phys. 5(2003), "Focus on Complex (Dusty) Plasmas", ed. by G.E. Morfill and H. Kersten.
2. V. E. Fortov, O. Petrov, G. E. Morfill, H. M. Thomas et.al., J. Exp. Theor. Phys. 96(2003), 704.
3. O. Arp, D. Block, A. Piel, A. Melzer, Phys. Rev. Lett. 93(2004), 165004.
4. B. M. Annaratone, M. Glier, T. Stuffler, M. Raif, H. M. Thomas, G. E. Morfill, New J. Phys. 5(2003), 92.