Electrical critical dimension measurement method by integration of test structure into MEMS devices

Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05

Volumn 2, Issue , 2005, Pages 2031-2034

  Ito, Kota ^a   Mita, Yoshio ^a   Kubota, Masanori ^a   Marty, Frédéric ^b   Bourouina, Tank ^b   Shibata, Tadashi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b National Centre of Scientific Research   (France)

Author keywords

CD SEM; Electrical critical dimension measurement; Joule heating; Test structure

Indexed keywords

CD-SEM; ELECTRICAL CRITICAL DIMENSION MEASUREMENTS; JOULE HEATING; TEST STRUCTURES;

HEATING; IMAGE PROCESSING; SCANNING ELECTRON MICROSCOPY; SILICON;

MICROELECTROMECHANICAL DEVICES;

EID: 27544434871     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2005.1497501     Document Type: Conference Paper

References (3)

1. B. Saadany, F. Marty, Y. Mita, D. Khalil, and T. Bourouina, "A MEMS Tunable Optical Filter Based on Vertical DBR Architecture," Design, Test, Integration and Packaging of MEMS/MOEMS, May 2004.
2. V. D. Pauw, "A Method of Measuaring the Resistivity and Hall Coefficient on Lamellae of Arbitrary Shape." Philips Technical Review, vol. 20, 1958.
3. S. Enderling, M. H. Dicks, S. Smith, J. T. M. Stevenson, and A. J. Walton, "Design Rules to Minimize the Effect of Joule Heating in Greek Cross Test Structures," Transactions on Semiconductor Manufacturing, 2004.