The Effects of Plasma Nitriding on the Structure and Properties of Electrodeposited Chromium Film

Plating and Surface Finishing

Volumn 83, Issue 5, 1996, Pages 146-148

  Ge, J P ^a  

^a DALIAN JIAOTONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2742548669     PISSN: 03603164     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (7)

1. J.I. Onate, J.K. Dennis and S. Hamilton, Trans. IMF, 65, 99(1987).
2. J.I. Onate and J.K. Dennis, Metal Fin., 87, 25 (1989).
3. W. C. Oliver, R. Hutchings and J. B. Pethica, Metall. Trans., 15A, 2221 (1984).
4. R. Hutchings. Mat. Sci. & Eng., 69, 129 (1985).
5. J.I. Onate, J.K. Dennis, et al., Heat Treatment of Metals, Vol. 14, 24 (1987).
6. G. Dearnaly, Thin Solid Films, 107, 31 (1983).
7. H.G. Zhu, Materials Protection, 2(10), 6 (1991) (in Chinese).