A simple and effective lift-off with positive photoresist

Journal of Micromechanics and Microengineering

Volumn 15, Issue 11, 2005, Pages 2136-2140

  Lee, Hyung Suk ^a   Yoon, Jun Bo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; EVAPORATION; LITHOGRAPHY; THICKNESS MEASUREMENT; ULTRAVIOLET RADIATION;

DIFFUSERS; LIFT-OFF METHODS; PHOTORESIST PATTERNS;

PHOTORESISTS;

EID: 27144553734     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/11/020     Document Type: Article

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