Atom nanolithography with multilayer light masks: Particle optics analysis

Physical Review A - Atomic, Molecular, and Optical Physics

Volumn 72, Issue 2, 2005, Pages

  Arun, R ^a   Averbukh, I Sh ^a   Pfau, T ^b  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

^b UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM NANOLITHOGRAPHY; NONLINEAR SPATIAL SQUEEZING; PARAXIAL APPROXIMATION; PARTICLE OPTICS ANALYSIS;

FOCUSING; IMAGE PROCESSING; LENSES; LIGHT MEASUREMENT; MULTILAYERS; NONLINEAR CONTROL SYSTEMS; PARTICLE OPTICS;

NANOTECHNOLOGY;

EID: 27144542377     PISSN: 10502947     EISSN: 10941622     Source Type: Journal    
DOI: 10.1103/PhysRevA.72.023417     Document Type: Article

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