Hafnium-based high-k dielectrics

2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA-TECH, Proceedings of Technical Papers

Volumn , Issue , 2005, Pages 122-125

  Lee, Jack C ^a   Kang, C ^a   Rhee, S ^a   Choi, C ^a   Krishnan, S ^a   Ok, I ^a   Akbar, M ^a   Kim, H ^a   Zhu, F ^a   Zhang, M ^a   Lee, T ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 27144487376     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. L. Kang, et al, IEDM Tech. Dig. 35, (2000)
2. B. H. Lee, et al, IEDM Tech. Dig. 39, (2000)
3. K.Onishi, et al, IEDM Tech. Dig. 659 (2001)
4. Y. H. Kim, et al, Proc. of IRPS, 46 (2003)
5. S. J. Rhee, et al, Proc. of IRPS, 269 (2004)
6. C. S. Kang, et al, IEDM Tech. Dig. 865 (2002)
7. H.-J. Cho, et al, IEEE Elec. Dev. Lett., 23, 249, (2002)