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Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 71, Issue 5, 2005, Pages

Translocation of double-strand DNA through a silicon oxide nanopore

(4) Storm, A J a Chen, J H a,b Zandbergen, H W a Dekker, C a

a DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

b NETHERLANDS INSTITUTE FOR METALS RESEARCH (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DNA TRANSLOCATION; SILICON OXIDE NANOPORES; VOLTAGE-BIASED PORE;

CONDITION MONITORING; ELECTRIC CONDUCTIVITY; MOLECULAR DYNAMICS; NANOSTRUCTURED MATERIALS; SILICON COMPOUNDS;

DNA;

ARTIFICIAL MEMBRANE; BIOMATERIAL; DNA; NANOMATERIAL; SILICON DIOXIDE;

ARTIFICIAL MEMBRANE; CHEMISTRY; CONFORMATION; DEVICES; ELECTROCHEMISTRY; EVALUATION STUDY; GENETIC PROCEDURES; MATERIALS TESTING; MOTION; NANOTECHNOLOGY; POROSITY; PROCEDURES; TRANSPORT AT THE CELLULAR LEVEL;

BIOCOMPATIBLE MATERIALS; BIOLOGICAL TRANSPORT; BIOSENSING TECHNIQUES; DNA; ELECTROCHEMISTRY; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MOTION; NANOSTRUCTURES; NANOTECHNOLOGY; NUCLEIC ACID CONFORMATION; POROSITY; SILICON DIOXIDE;

EID: 26944479214 PISSN: 15393755 EISSN: 15502376 Source Type: Journal
DOI: 10.1103/PhysRevE.71.051903 Document Type: Article

Times cited : (404)

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