Materials compatibility and organic Build-Up during Ozone-Based cleaning of semiconductor devices

Solid State Phenomena

Volumn 76-77, Issue , 2001, Pages 63-66

  De Smedt, F ^a   De Gendt, S ^b   Heyns, M M ^b   Vinckier, C ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b IMEC   (Belgium)

Author keywords

Carboxylic acids; Ion Chromatography; Organic; Ozone; Semiconductor cleaning

Indexed keywords

CARBOXYLIC ACIDS; CHEMICAL REACTIONS; DEIONIZED WATER; ION CHROMATOGRAPHY; IONS; OZONE; PHASE INTERFACES; SEMICONDUCTOR DEVICES; SULFUR COMPOUNDS;

CHEMICAL COMPOSITIONS; GAS-PHASE REACTIONS; ORGANIC; OXALATE IONS; OZONE GENERATOR; REACTION VESSEL; SEMI-CONDUCTOR CLEANING; TEFLON TUBING;

ORGANIC SEMICONDUCTOR MATERIALS;

EID: 26644473252     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.76-77.63     Document Type: Conference Paper

References (4)

1. M.M. Heyns, P. W. Mertens, J. Ruzyllo and M.Y. Lee, Solid State Technology, p. 37, march 1999
2. Frank De Smedt, Fundamental study of the behaviour of ozone in water: application in the cleaning of semiconductor devices, Ph.D. dissertation, Faculty of Sciences , University of Leuven, 2000
3. H. Vankerckhoven; C. Vinckier; F. De Smedt; S. De Gendt; M. Claes and MM Heyns, Determination of photoresist degradation products in ozone/DI-water processes by Ion Chromatography, paper presented at UCPSS 2000, Oostend, Belgium
4. F. De Smedt, S De Gendt; M.M. Heyns and C Vinckier, The ozone solubility and its decay in aqueous solutions: crucial issues in ozonated chemistries for semiconductor cleaning, paper presented at UCPSS 2000, Oostend, Belgium