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Volumn 76-77, Issue , 2001, Pages 189-190
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Fundamentals of wafer rinse processes and the interactions with water conservation and recycling in semiconductor manufacturing plants
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Author keywords
[No Author keywords available]
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Indexed keywords
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON WAFERS;
WATER CONSERVATION;
CONTAMINATION RISKS;
ENVIRONMENTAL AND ECONOMIC IMPACTS;
RATE-LIMITING STEPS;
RINSE WATER;
SEMICONDUCTOR MANUFACTURING;
TOOLS AND TECHNIQUES;
ULTRA PURE WATER;
WAFER RINSING;
WATER RECYCLING;
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EID: 26644457941
PISSN: 10120394
EISSN: 16629779
Source Type: Book Series
DOI: 10.4028/www.scientific.net/SSP.76-77.189 Document Type: Conference Paper |
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Times cited : (1)
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References (0)
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