Decomposition of gaseous organic contaminants by Surface Discharge Induced Plasma Chemical Processing-SPCP

Conference Record - IAS Annual Meeting (IEEE Industry Applications Society)

Volumn 1992-January, Issue , 1992, Pages 1570-1574

  Oda, Tetsuji ^a   Yamashita, Ryuuichi ^a   Haga, Ichiro ^a   Takahashi, Tadashi ^a   Masuda, Senichi ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b FUKUI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; CHEMICAL INDUSTRY; ELECTRIC DISCHARGES; ETHYLENE;

DECOMPOSITION PERFORMANCE; ELECTRIC POWER; ORGANIC CONTAMINANT; PLASMA CHEMICAL PROCESSING; PRODUCT ANALYSIS; REMOVAL RATE; RESIDENCE TIME;

DECOMPOSITION;

EID: 26444555595     PISSN: 01972618     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IAS.1992.244376     Document Type: Conference Paper

References (0)