Atomic force microscopy local oxidation of silicon nitride thin films for mask fabrication

Nanotechnology

Volumn 16, Issue 11, 2005, Pages 2731-2737

  Fernandez Cuesta, Irene ^a   Borrisé, Xavier ^a   Pérez Murano, Francesc ^a  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC CURRENTS; NANOTECHNOLOGY; OXIDATION; SILICON NITRIDE;

NANOMETER-SCALES; SILICON NITRIDE FILMS; SILICON SUBSTRATES;

THIN FILMS;

EID: 26444477291     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/11/045     Document Type: Article

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