Physisorbed water layer formation on fully hydroxylated mesoporous silicas

Journal of Colloid and Interface Science

Volumn 291, Issue 2, 2005, Pages 353-360

  Collins, Kenneth E ^a   De Camargo, Vanessa R ^a   Dimiras, Alessandra B ^a   Menezes, Deborah T C ^a   Da Silva, Priscila A ^a   Collins, Carol H ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

Adsorption; Kinetic isotherms; Monolayer; Silica; Water

Indexed keywords

ADSORPTION ISOTHERMS; ATMOSPHERIC HUMIDITY; CONCENTRATION (PROCESS); HUMIDITY CONTROL; HYDROXYLATION; KINETIC THEORY; THERMOGRAVIMETRIC ANALYSIS; ADSORPTION; KINETICS; MONOLAYERS; WATER;

KINETIC ISOTHERMS; MESOPOROUS SILICA; WATER LAYER FORMATION;

MESOPOROUS MATERIALS; SILICA;

SILICON DIOXIDE;

ADSORPTION; ARTICLE; EQUILIBRIUM CONSTANT; GRAVIMETRY; HUMIDITY; HYDROXYLATION; KINETICS; PHYSICAL CHEMISTRY; PRIORITY JOURNAL; QUANTITATIVE ANALYSIS; STOICHIOMETRY; SURFACE PROPERTY;

CONTROLLED HUMIDITIES; HYDROXYLATED SILICA; KINETIC ISOTHERMS; MESOPOROUS SILICA; QUANTITATIVE INFORMATION; QUASI-EQUILIBRIUM; SURFACE CONCENTRATION; WATER LAYER FORMATION;

EID: 26444460814     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2005.05.022     Document Type: Article

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