Comparative study on effects of low energy N+ implantation and γ-ray radiation on heredity and development of Arabidopsis thaliana

Plasma Science and Technology

Volumn 7, Issue 3, 2005, Pages 2879-2884

  Zhang, Genfa ^a   Li, Ke ^a   Shi, Xiaoming ^a   Nie, Yanli ^a   Zhang, Jun ^b   Zhou, Hongyu ^a   Lu, Ting ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

^b JOHNS HOPKINS UNIVERSITY SCHOOL OF MEDICINE   (United States)

Author keywords

ray; Arabidopsis thaliana; Development; Genetic variation; Ion implantation

Indexed keywords

EID: 26444444739     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/7/3/023     Document Type: Article

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