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Volumn 49, Issue 20, 2004, Pages 3283-3292
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Numerical simulation of electrode process in Cu/CuSO4 + H 2SO4 system
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Author keywords
Copper electrode; Copper sulphate solution; Electromigration; Numerical simulation; Passivity
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Indexed keywords
COMPUTER SIMULATION;
COPPER ALLOYS;
CURRENT DENSITY;
DIFFUSION;
DISSOCIATION;
ELECTROCHEMISTRY;
ELECTRODES;
ELECTROLYTES;
ELECTROMIGRATION;
HYDROGEN;
MATHEMATICAL MODELS;
PASSIVATION;
RATE CONSTANTS;
COPPER ELECTRODES;
COPPER SULFATE SOLUTION;
ELECTROCHEMICAL REACTIONS;
PASSIVITY;
BINARY MIXTURES;
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EID: 2642568605
PISSN: 00134686
EISSN: None
Source Type: Journal
DOI: 10.1016/j.electacta.2004.02.041 Document Type: Article |
Times cited : (28)
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References (22)
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