A hands-on laboratory in the fundamentals of semiconductor manufacturing: The capstone course of a new undergraduate option

Chemical Engineering Education

Volumn 36, Issue 1, 2002, Pages 14-19

  Chang, Jane P ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EDUCATION TRAINING; GATE OXIDES; SEMICONDUCTOR MANUFACTURING; SHEET RESISTANCE; WET ETCHING;

CHEMICAL ENGINEERING; CHEMICAL LABORATORIES; CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; DRY ETCHING; HETEROJUNCTION BIPOLAR TRANSISTORS; ION IMPLANTATION; OXIDATION; PERSONAL COMPUTERS; PHOTOLITHOGRAPHY; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SOLID STATE DEVICE STRUCTURES; STATISTICAL MECHANICS; THIN FILMS;

ENGINEERING EDUCATION;

EID: 2642538562     PISSN: 00092479     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (17)

1. Semiconductor Industry Association at 〈http://www.semichips.org/ 〉
2. Ernst, E.W., "Workplace Changes and Engineering Education Reform," 1996 Frontier in Education Proceedings, IEEE, 882 (1996)
3. Flemings, M.C., and R.W. Cahn, "Organization and Trends in Materials Science and Engineering Education in the US and Europe," Acta Materialia, 48(1), 371 (2000)
4. Dang, S.S., R.A. Matthes, and C.G. Takoudis, "A Web-Based Course in the Fundamentals of Microelectronics Processing," Chem. Eng. Ed., 34(4), 350 (2000)
5. University of Illinois at Chicago, Department of Chemical Engineering at 〈http://www.uic.edu/eng/meng/che_494.htm〉
6. Muscat, A.J., E.L. Allen, E.D.H. Green, and L.S. Vanasupa, "Interdisciplinary Teaching and Learning in a Semiconductor Processing Course," J. Eng. Ed., 87(4), 413 (1998)
7. Colorado School of Mines, Department of Chemical Engineering at 〈http://www.mines.edu/fs_home/cwolden/chen435/CHEN435.htm〉
8. Massachusetts Institute of Technology, Department of Chemical Engineering, 1+0.480J Microelectronics Processing Laboratory, jointly listed with 6.152J Microelectronics Processing Technology in the Electrical Engineering Department
9. Oregon State University, Department of Chemical Engineering, ChE 444/ChE 544 Thin Film Processing Course
10. University of Arizona, Department of Chemical Engineering, ChE 415 Micro Electronics Manufacturing
11. Chang, J.P., lecture notes in the Semiconductor Manufacturing Laboratory course (ChE104C), published by Course Reader Materials at UCLA. A sample lecture note is available on the course webpage at 〈http://www.seas.ucla.edu/ Chang/Courses.htm〉
12. Jaeger, R.C., Introduction to Microelectronic Fabrication, Modular Series on Solid State Devices, Vol. 5, Addison Wesley
13. Wolf. S., and R.N. Tauber, Silicon Processing for VLSI Era, Vol 1. Process Technology, Lattice Press (1986)
14. Sze, S.M., VLSI Technology, McGraw-Hill (1988)
15. Ziegler, J.F., J.P. Biersack, and U. Littmark. The Stopping and Range of Ions in Solids, Pergamon Press, New York, NY (1985). TRIM is an experimental and research software (ISBN-0-08-021603-X) developed by IBM for non-commercial and experimental use by researchers and students.
16. Nanoelectronic Research Facility, UCLA, at 〈http://www.nanolab.ucla. edu/〉
17. NSF Engineering Online News, ''Learn to Make Your Own Semiconductor Device," November, 2000, at 〈http://www.eng.nsf.gov/engnews/2000/00- 24SemiConductorDevice/00-24semiconductordevice.htm〉