Lab-based unit operations in microelectronics processing

Chemical Engineering Education

Volumn 37, Issue 3 SPEC. ISS., 2003, Pages 188-195

  Chang, Chih Hung ^a,b   Koretsky, Milo D ^a,b   Kimura, Sho ^a,b   Rochefort, Skip ^a,b   Shaner, Cyndie ^a  

^a OREGON STATE UNIVERSITY   (United States)

^b Ohio State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODE SURFACE; PROJECT PLANNING; SEMICONDUCTOR INDUSTRY; TIME MANAGEMENT;

BOUNDARY LAYERS; CHEMICAL LABORATORIES; CYCLIC VOLTAMMETRY; ELECTRODES; ENGINEERING EDUCATION; FLOW OF FLUIDS; PHOTOLITHOGRAPHY; PHOTORESISTORS; PROJECT MANAGEMENT; REDOX REACTIONS; SILICON WAFERS; SPIN COATING; STUDENTS; SURFACE PHENOMENA; THERMODYNAMICS; TRANSISTORS;

MICROELECTRONIC PROCESSING;

EID: 2642511627     PISSN: 00092479     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

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