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Volumn 1992-December, Issue , 1992, Pages 323-326

0.25 μ m gate length N-InGaP/InGaAs/GaAs HEMT DCFL circuit with lower power dissipation than high-speed Si CMOS circuits

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC LOSSES; GALLIUM COMPOUNDS; LOW POWER ELECTRONICS; TIMING CIRCUITS; VLSI CIRCUITS;

EID: 26344479847     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.1992.307370     Document Type: Conference Paper
Times cited : (12)

References (12)
  • 1
    • 84951490594 scopus 로고
    • A new field-effect transistor with selectively doped GaAs/N-AlxGai-XAs heterojunctions
    • T. Mimura, S. Hiyamizu, T. Fujii, and K. Nanbu, "A new field-effect transistor with selectively doped GaAs/N-AlxGai-XAs heterojunctions, " Japan J. Appl. Phys., vol. 19, pp. L225-227, 1980.
    • (1980) Japan J. Appl. Phys. , vol.19 , pp. L225-227
    • Mimura, T.1    Hiyamizu, S.2    Fujii, T.3    Nanbu, K.4
  • 2
    • 0024139536 scopus 로고
    • A HEMT LSI for a multibit data register
    • Feb.
    • Y. Watanabe et al., "A HEMT LSI for a multibit data register, " in ISSCC Dig. Tech. Papers, Feb. 1990, pp. 86-87.
    • (1990) ISSCC Dig. Tech. Papers , pp. 86-87
    • Watanabe, Y.1
  • 3
    • 0025450685 scopus 로고
    • A gigahertz cryogenic HEMT pseudorandom number generator chip set
    • Feb.
    • Y. Asada, et al., "A gigahertz cryogenic HEMT pseudorandom number generator chip set, " in ISSCC Dig. Tech. Papers, Feb. 1990, pp. 86-87.
    • (1990) ISSCC Dig. Tech. Papers , pp. 86-87
    • Asada, Y.1
  • 8
    • 0025576479 scopus 로고
    • 0. 2 u m or less i-line lithography by phase-shifting-mask technology
    • H. Jinbo, and Y. Yamashita, "0. 2 u. m or less i-line lithography by phase-shifting-mask technology, " in IEDM Tech. Dig., 1990, pp. 825-828.
    • (1990) IEDM Tech. Dig. , pp. 825-828
    • Jinbo, H.1    Yamashita, Y.2
  • 9
    • 0025660639 scopus 로고
    • New phase-shifting mask with highly transparent SiC2 phase shifters
    • Optical/Laser Microlithography III
    • I. Hanyu, A. Asai, K. Kosemura, H. Ito, M. Nunokawa, and M. Abe, "New phase-shifting mask with highly transparent SiC2 phase shifters, " SPIE vol. 1264, Optical/Laser Microlithography III, pp. 167-177, 1990.
    • (1990) SPIE , vol.1264 , pp. 167-177
    • Hanyu, I.1    Asai, A.2    Kosemura, K.3    Ito, H.4    Nunokawa, M.5    Abe, M.6
  • 10
    • 0024753983 scopus 로고
    • Short-channel effects in subquarter-micrometer-gate hemts: Simulation and experiment
    • Y. Awano, M. Kosugi, K. Kosemura, T. Mimura, and M. Abe, "Short-channel Effects in Subquarter-Micrometer-Gate HEMTs: Simulation and Experiment, " IEEE Trans. Electron Devices ED-36 (1989), pp. 2260.
    • (1989) IEEE Trans. Electron Devices , vol.ED-36 , pp. 2260
    • Awano, Y.1    Kosugi, M.2    Kosemura, K.3    Mimura, T.4    Abe, M.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.