Electrical techniques for the characterization ot dielectric films

Electrochemical Society Interface

Volumn 14, Issue 3, 2005, Pages 17-19

  Kundu, T ^a   Garg, R ^a   Chowdhury, N A ^a   Misra, D ^b  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GATE OXIDE CAPACITANCE; METAL/INSULATOR/SEMICONDUCTOR (MIS); VOLTAGE-INDEPENDENT GATE OXIDE CAPACITANCE;

CAPACITANCE; ELECTRIC FIELD EFFECTS; ELECTRIC INSULATORS; ELECTRIC POTENTIAL; SEMICONDUCTOR MATERIALS;

DIELECTRIC FILMS;

EID: 26244455351     PISSN: 10648208     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

References (5)

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4. M. J. Deen and F. Pascal, in The Springer Handbook of Electronic and Optoelectronic Materials, S. Kasap and P. Capper, Editors, 53 ms pages, Springer Science Handbook, Heidelberg, Germany, To be published in 2006.
5. M. J. Deen, in Silicon Nitride and Silicon Dioxide Thin Insulating Films VII, R. E. Sah, K. B. Sundaram, M. J. Deen, D. Landheer, W. D. Brown, and D. Misra, PV 2003-02, p. 3, The Electrochemical Society Proceedings Series Pennington, NJ (2003).