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Volumn 284, Issue 3-4, 2005, Pages 319-323
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Annealing effect on properties of Zno thin films grown on LiNbO3 substrates by MOCVD
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Author keywords
A1. Annealing; A1. LiNbO3; A1. PL; A1. XRD; A3. MOCVD; B1. ZnO thin films
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Indexed keywords
ANNEALING;
ATOMIC FORCE MICROSCOPY;
CRYSTAL GROWTH;
LITHIUM COMPOUNDS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
OPTICAL PROPERTIES;
PHOTOLUMINESCENCE;
SUBSTRATES;
THIN FILMS;
X RAY DIFFRACTION;
LINBO3;
PL;
STRUCTURAL PROPERTIES;
ZNO THIN FILMS;
ZINC OXIDE;
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EID: 26044439009
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.07.031 Document Type: Article |
Times cited : (21)
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References (19)
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