Simultaneous treatment of semiconductor wastewater and distillery slops by mixing and precipitation/coagulation

Journal of Chemical Technology and Biotechnology

Volumn 80, Issue 10, 2005, Pages 1125-1130

  Navarro, Ronald R ^a   Navarro, Rosvic C ^a   Alfafara, Catalino G ^a   Demafelis, Rex B ^a   Tatsumi, Kenji ^b  

^a UNIVERSITY OF THE PHILIPPINES LOS BAÑOS   (Philippines)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Distillery slops; Heavy metals; Precipitation; Semiconductor; Wastewater treatment

Indexed keywords

CHEMICAL OXYGEN DEMAND; CHEMICALS REMOVAL (WATER TREATMENT); COAGULATION; COPPER; DISTILLERIES; HEAVY METALS; MIXING; PH; PRECIPITATION (CHEMICAL); SEMICONDUCTOR DEVICES;

COPPER REMOVAL; DISTILLERY SLOPS; MELANOIDIN; SEMICONDUCTOR INDUSTRY WASTEWATER;

WASTEWATER TREATMENT;

COPPER; COPPER ION; ORGANIC MATTER;

ORGANIC MATTER; REMOVAL; WASTEWATER;

ARTICLE; CHEMICAL OXYGEN DEMAND; CONTROLLED STUDY; DECOLORIZATION; INDUSTRY; PH; POLLUTANT; PRECIPITATION; SEMICONDUCTOR; SURFACE CHARGE; VOLUMETRY; WASTE COMPONENT REMOVAL; WASTE WATER MANAGEMENT;

EID: 25844486916     PISSN: 02682575     EISSN: None     Source Type: Journal    
DOI: 10.1002/jctb.1292     Document Type: Article

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