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Volumn , Issue , 2005, Pages 69-72
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Evaluation and integration of metal gate electrodes for future generation dual metal CMOS
e
IBM
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS MATERIALS;
ELECTRICAL STABILITY;
METAL GATE ELECTRODES;
WORK FUNCTION;
ELECTRODES;
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EID: 25844437110
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/icicdt.2005.1502594 Document Type: Conference Paper |
Times cited : (14)
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References (6)
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