PANI-CSA: An easy method to avoid ITO photolithography in PLED manufacturing

Macromolecular Symposia

Volumn 228, Issue , 2005, Pages 263-272

  Vacca, Paolo ^a   Maglione, Maria Grazia ^b   Minarini, Carlo ^a   Salzillo, Giovanna ^b   Amendola, Eugenio ^c   Della Sala, Dario ^a   Rubino, Alfredo ^a  

^a ENEA CR Portici   (Italy)

^b STMICROELECTRONICS   (Italy)

^c CNR   (Italy)

Author keywords

Conducting polymers; Doped polyaniline; Light emitting diodes (LED); Spin coating; UV patterning

Indexed keywords

ELECTRODES; EVAPORATION; INDIUM COMPOUNDS; LIGHT EMITTING DIODES; OPTIMIZATION; SPIN COATING; ULTRAVIOLET SPECTROSCOPY; VACUUM; X RAY DIFFRACTION ANALYSIS;

CONDUCTING POLYMERS; DOPED POLYANILINE; POLYANILINE; UV PATTERNING;

PHOTOLITHOGRAPHY;

EID: 25644433512     PISSN: 10221360     EISSN: None     Source Type: Journal    
DOI: 10.1002/masy.200551024     Document Type: Conference Paper

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